2026-10-14T13:21:39Z https://www.scidb.cn/oai

10.57760/sciencedb.08591 2024-05-15T16:14:56Z

2024-05-15 Ge-Sb Thin Films Patterned by Heat-Mode Lithography doi:10.57760/sciencedb.08591 en A binary Te-free phase-change material Ge9.15Sb90.85 (GS) is investigated as the heat-mode resist. A high etching selectivity ratio can be achieved by matching a suitable developer. A reasonable explanation for the positive development is proposed based on the chemical binding energy analysis. High-resolution relief patterns are fabricated on the GS films by laser direct writing and wet etching. It reveals that GS is a promising heat-mode resist for the fabrication of photonic devices. GeSb; phase-change materials; resist; heat-mode lithography 赵培均 郑金轮 张奎 王阳 魏劲松 PUBLIC https://creativecommons.org/licenses/by-nc/4.0/ dataset Science Data Bank