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    <identifier>10.57760/sciencedb.14060</identifier>
    <datestamp>2024-05-14T10:39:25Z</datestamp>
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<oai_dc:dc xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd">
  <dc:date>2024-05-14</dc:date>
  <dc:title>Low Crosstalk Waveguide Crossing for Lithium Niobate Integration Application</dc:title>
  <dc:identifier>doi:10.57760/sciencedb.14060</dc:identifier>
  <dc:language>en</dc:language>
  <dc:description>With the development of thin-film lithium niobate (TFLN) in the field of integrated photonics, it has become particularly important to achieve large-scale integration. The multi-channel waveguide crossing which has low crosstalk and loss can enhance the integration density and routing flexibility. Due to the anisotropy of lithium niobate, we propose and demonstrate 2&amp;times;2 waveguide crossing with different waveguide sizes based on the self-imaging. The waveguide crossing based on 600 nm X-cut TFLN. The crosstalk of those crossings are less than-33.31 and-30.81 dB, respectively, in C-band. The corresponding insertion loss minima are about 0.094 dB and 0.356 dB, respectively.</dc:description>
  <dc:subject>waveguide crossing; Lithium Niobate; integrated photonics; self-imaging</dc:subject>
  <dc:creator>Hu Yibiao</dc:creator>
  <dc:creator>He Jiajing</dc:creator>
  <dc:creator>Wang Jun</dc:creator>
  <dc:rights>RESTRICTED</dc:rights>
  <dc:type>dataset</dc:type>
  <dc:publisher>Science Data Bank</dc:publisher>
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