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    <identifier>10.57760/sciencedb.14854</identifier>
    <datestamp>2024-01-08T15:18:57Z</datestamp>
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  <dc:date>2024-01-08</dc:date>
  <dc:title>Influence of Ion Oxygen Concentration on Properties of Optical Films Deposited by Double Ion Beam Sputtering</dc:title>
  <dc:identifier>doi:10.57760/sciencedb.14854</dc:identifier>
  <dc:language>en</dc:language>
  <dc:description>Prepare samples using dual ion beam sputtering deposition equipment. Draw a graph using Origin software, measure the sample transmittance using a spectrophotometer, and fit the refractive index and extinction coefficient using Optilayer software. The weak absorption of the sample was measured using the principle of surface thermal lenses, and temperature rise data was collected by continuous laser irradiation at 1064 nm. Use XPS to characterize the bond energy of Si and O in SiO2 samples.&amp;nbsp;</dc:description>
  <dc:subject>ionic oxygen concentration; double ion beam sputtering; optical thin films</dc:subject>
  <dc:creator>Yanzhi Wang</dc:creator>
  <dc:creator>Chang Chen</dc:creator>
  <dc:rights>RESTRICTED</dc:rights>
  <dc:type>dataset</dc:type>
  <dc:relation>http://www.doi.org/https://doi.org/10.1016/j.optmat.2022.113349</dc:relation>
  <dc:publisher>Science Data Bank</dc:publisher>
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