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    <identifier>10.57760/sciencedb.19215</identifier>
    <datestamp>2024-12-31T15:32:25Z</datestamp>
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  <dc:date>2024-12-31</dc:date>
  <dc:title>Ion-beam-sputtered hafnium dioxide laser thin films.</dc:title>
  <dc:identifier>doi:10.57760/sciencedb.19215</dc:identifier>
  <dc:language>en</dc:language>
  <dc:description>This dataset contains information on HfO₂ thin films, which are known for their high laser damage threshold and low absorption properties. The HfO₂ thin films were prepared using dual ion beam sputtering and annealed in the atmosphere at temperatures ranging from 200 to 700&amp;deg;C. The dataset includes systematic characterization of the optical properties, microstructure, film stress, and absorption loss of the HfO₂ thin films at various annealing temperatures.</dc:description>
  <dc:subject>HfO2 thin films; annealing temperature; dual-ion-beam sputtering; surface roughness.</dc:subject>
  <dc:creator>Zhao Mingxue</dc:creator>
  <dc:creator>Wang Yanzhi</dc:creator>
  <dc:rights>RESTRICTED</dc:rights>
  <dc:type>dataset</dc:type>
  <dc:relation>http://www.doi.org/10.1016/j.optmat.2024.116241</dc:relation>
  <dc:relation>http://www.doi.org/10.1117/12.3036897</dc:relation>
  <dc:publisher>Science Data Bank</dc:publisher>
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