2026-10-14T05:06:55Z https://www.scidb.cn/oai

10.57760/sciencedb.21051 2025-02-18T17:16:33Z

2025-02-18 Effect of fluorine contamination from multilayer dielectric grating fabrication on picosecond-laser-induced damage resistance doi:10.57760/sciencedb.21051 en In this study, two different beam-current etching protocols were employed in fabricating MLDGs and thin films to comprehensively evaluate the adverse effects of subsurface defects introduced by the etching process. The results revealed that the etching process introduced penetration of fluorine contamination defects, and the degree of fluorine contamination increased in the high-beam etching (HBE) protocol. Furthermore, the quantity of typical shallow damage pits exhibited a significant increase in the HBE films under 7.6-ps laser irradiation, and the 0% laser-induced damage thresholds of gratings and thin films fabricated through the low-beam etching (LBE) protocol achieved significant improvements of 33% and 26%, respectively, compared to those obtained with the HBE protocol. The LBE protocol will be employed in meter-scale grating fabrication to improve picosecond laser damage resistance. 多层介质膜光栅; 皮秒激光; 氟污染; 低束流刻蚀工艺; 亚表面缺陷; 激光诱导损伤阈值 Shuai Kun Qiu Keqiang Liu Xiaofeng Zhao Yuanan Xu Guang Li Dawei Zhang Miaomiao Zhou Yan Sun Jian Cui Yun Hong Yilin Dai Yaping Shao Jianda PUBLIC https://creativecommons.org/licenses/by-nc-nd/4.0/ dataset Science Data Bank