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    <identifier>10.57760/sciencedb.29407</identifier>
    <datestamp>2025-08-29T11:37:20Z</datestamp>
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  <dc:date>2025-08-29</dc:date>
  <dc:title>Ga2O3 Vertical SBD With Suspended Field Plate Assisted Shallow Mesa Termination for Multi-kilovolt and Ampere-class Applications</dc:title>
  <dc:identifier>doi:10.57760/sciencedb.29407</dc:identifier>
  <dc:language>en</dc:language>
  <dc:description>In this work, a vertical Ga2O3&amp;nbsp;Schottky barrier diode with suspended field plate assisted shallow mesa&amp;nbsp;termination&amp;nbsp;(SFPM-SBD)&amp;nbsp;is proposed and fabricated.&amp;nbsp;The suspended field plate is achieved by using Cl2&amp;nbsp;in the ICP etching process to facilitate isotropic etching of Ga2O3.&amp;nbsp;Compared with shallow mesa SBD, the introduction of SFPM can further optimize the electric field distribution. Consequently, a high breakdown voltage (BV) of over 3.5 kV&amp;nbsp;and a low specific on-resistance of 5.77 m&amp;Omega;∙cm2&amp;nbsp;are achieved, resulting in a power figure of merit &amp;gt;2.12 GW/cm2. Furthermore, the large-area device with 3&amp;times;3 mm2&amp;nbsp;is fabricated, achieving a BV&amp;nbsp;exceeding 1.5 kV and a high forward current of 12 A at 2 V. The simplified fabrication&amp;nbsp;process of the SFPM-SBD, combined with its outstanding performance, makes it a promising candidate for multi-kilovolt and ampere-class applications.</dc:description>
  <dc:subject>Gallium oxide; Schottky barrier diode; Termination; Electric field management</dc:subject>
  <dc:creator>韩学历</dc:creator>
  <dc:creator>许晓锐</dc:creator>
  <dc:creator>王正波</dc:creator>
  <dc:creator>杨瀚超</dc:creator>
  <dc:creator>陈得森</dc:creator>
  <dc:creator>邓逸聪</dc:creator>
  <dc:creator>陈端阳</dc:creator>
  <dc:creator>张海忠</dc:creator>
  <dc:creator>齐红基</dc:creator>
  <dc:rights>RESTRICTED</dc:rights>
  <dc:type>dataset</dc:type>
  <dc:relation>http://www.doi.org/10.1109/TED.2025.3584011</dc:relation>
  <dc:publisher>Science Data Bank</dc:publisher>
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