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    <responseDate>2026-10-14T14:41:30Z</responseDate>
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    <identifier>10.57760/sciencedb.35605</identifier>
    <datestamp>2026-01-19T10:08:43Z</datestamp>
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  <dc:date>2026-01-19</dc:date>
  <dc:title>Dataset of Magnetron Sputtered Coatings</dc:title>
  <dc:identifier>doi:10.57760/sciencedb.35605</dc:identifier>
  <dc:language>en</dc:language>
  <dc:description>This dataset was generated from systematic magnetron sputtering experiments on single-layer Mo, Si, B4C, and C coatings. For each material, two independent experimental series were performed: one with a fixed argon (Ar) gas flow rate and varying sputtering power, and the other with fixed sputtering power and varying Ar flow rate. These experiments were designed to investigate the influence of deposition parameters on coating properties and to construct a dataset for machine learning modeling.The dataset includes deposition parameters and corresponding coating properties, including thickness, density, roughness, and stress, measured using consistent characterization techniques. All data are organized in tabular form, with each row representing a single experiment and each column corresponding to a specific parameter or property. Standard physical units are used, and no data interpolation was applied.</dc:description>
  <dc:subject>Magnetron sputtering; Thin film coatings; Deposition process parameters; Coating properties</dc:subject>
  <dc:creator>Gao Kejia</dc:creator>
  <dc:creator>Cao Longxun</dc:creator>
  <dc:creator>Zhu Meiping</dc:creator>
  <dc:rights>PUBLIC</dc:rights>
  <dc:rights>https://creativecommons.org/licenses/by-nc/4.0/</dc:rights>
  <dc:type>dataset</dc:type>
  <dc:publisher>Science Data Bank</dc:publisher>
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