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    <responseDate>2026-10-12T02:11:05Z</responseDate>
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    <identifier>10.57760/sciencedb.j00186.000ys</identifier>
    <datestamp>2026-08-28T10:29:49Z</datestamp>
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  <dc:date>2026-08-28</dc:date>
  <dc:title>Simulated sputtering yields of niobium and its oxides, and experimental data on plasma and electrolytic plasma polishing of niobium samples.</dc:title>
  <dc:identifier>doi:10.57760/sciencedb.j00186.000ys</dc:identifier>
  <dc:language>en</dc:language>
  <dc:description>`sputteringyield.xlsx` contains sputtering yield data for niobium and its oxides calculated using SRIM software; `untreated Ar Ar+O2 sa sq sz.opju` presents surface roughness results for niobium samples that were untreated, or treated via plasma sputtering (without bias voltage) using pure argon or an argon-oxygen mixture; `150V-450V Sa Sq Sz.opju` shows surface roughness results for niobium samples treated via plasma sputtering in pure argon at various bias voltages; `450V Ar Ar+O2 sa sq sz.opju` displays surface roughness measurements for samples treated via plasma sputtering in pure argon and argon-oxygen mixtures at a 450V bias voltage; `200-300V PEP.opju` provides surface roughness results for niobium samples treated via electrolyte plasma polishing at different voltages; `EC wt%.opju` presents surface roughness results for samples treated via electrolyte plasma polishing at different electrolyte concentrations; all roughness data were obtained using a 3D optical profilometer. `MRR and Curent vs voltage.opju` shows the etching rate and current variations for niobium samples during electrolyte plasma polishing at different voltages; `MRR and Curent vs wt.opju` shows the etching rate and current variations at different electrolyte concentrations (both datasets were obtained directly during the experiments); `before and after PeP XRD.opju` contains XRD patterns of niobium samples before and after electrolyte plasma polishing; `precipitates XRD.opju` contains XRD patterns of the precipitates formed after electrolyte plasma polishing (all XRD data were obtained using an XRD instrument).</dc:description>
  <dc:subject>plasma; surface roughness; electrolyte plasma polishing; sputtering yield</dc:subject>
  <dc:creator>周海洋</dc:creator>
  <dc:rights>PUBLIC</dc:rights>
  <dc:rights>https://creativecommons.org/licenses/by-nc/4.0/</dc:rights>
  <dc:type>dataset</dc:type>
  <dc:publisher>Science Data Bank</dc:publisher>
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