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    <identifier>10.57760/sciencedb.j00186.00344</identifier>
    <datestamp>2023-11-24T14:20:52Z</datestamp>
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  <dc:date>2023-11-24</dc:date>
  <dc:title>Dataset of  latest developments in EUV photoresist evaluation capability at SSRF</dc:title>
  <dc:identifier>doi:10.57760/sciencedb.j00186.00344</dc:identifier>
  <dc:language>en</dc:language>
  <dc:description>The 08U1B beamline at SSRF provides the experimental platform for EUV photoresist evaluation,The performance of the transmission grating mask and the vibration control in the interference lithography experiment impact the quality of the interference fringe.Here, we present the original diffraction efficiency data simulated using Gsolver software, the original characterization images of fabricated transmission-grating-mask , the HP-15 nm original image produced through interference lithography experiment, and the beamline vibration data.</dc:description>
  <dc:subject>EUV; photoresist; SSRF</dc:subject>
  <dc:creator>Zhenjiang Li</dc:creator>
  <dc:creator>Chenghang Qi</dc:creator>
  <dc:creator>Beining Li</dc:creator>
  <dc:creator>Shuming Yang</dc:creator>
  <dc:creator>Jun Zhao</dc:creator>
  <dc:creator>Zhidi Lei</dc:creator>
  <dc:creator>Shijie Zhu</dc:creator>
  <dc:creator>Hao Shi</dc:creator>
  <dc:creator>Lu Wang</dc:creator>
  <dc:creator>Yanqing Wu</dc:creator>
  <dc:creator>Renzhong Tai</dc:creator>
  <dc:rights>PUBLIC</dc:rights>
  <dc:rights>https://creativecommons.org/licenses/by/4.0/</dc:rights>
  <dc:type>dataset</dc:type>
  <dc:relation>http://www.doi.org/10.1007/s41365-023-01351-8</dc:relation>
  <dc:publisher>Science Data Bank</dc:publisher>
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